Skip navigation
Please use this identifier to cite or link to this item: http://arks.princeton.edu/ark:/88435/dsp01g158bh77c
Title: Mechanisms for Anisotropic Reactive Ion Etching of Photoresist Via O2, CO2, N2/O2, and SO2/O2 Plasmas
Authors: Boyce, Craig H.
Advisors: Taylor, AT&T Bell Labs Gary N.
Department: Chemical and Biological Engineering
Class Year: 1994
Extent: 51 Pages
Other Identifiers: 5360
URI: http://arks.princeton.edu/ark:/88435/dsp01g158bh77c
Location : This thesis can be viewed in person at the Mudd Manuscript Library. To order a copy complete the Senior Thesis Request Form. For more information contact mudd@princeton.edu.
Type of Material: Princeton University Senior Theses
Appears in Collections:Chemical and Biological Engineering, 1931-2016

Files in This Item:
There are no files associated with this item.


Items in Dataspace are protected by copyright, with all rights reserved, unless otherwise indicated.