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Title: Mechanisms for Anisotropic Reactive Ion Etching of Photoresist Via O2, CO2, N2/O2, and SO2/O2 Plasmas
Authors: Boyce, Craig H.
Advisors: Taylor, AT&T Bell Labs Gary N.
Department: Chemical and Biological Engineering
Class Year: 1994
Extent: 51 Pages
Other Identifiers: 5360
Location : This thesis can be viewed in person at the Mudd Manuscript Library. To order a copy complete the Senior Thesis Request Form. For more information contact
Type of Material: Princeton University Senior Theses
Appears in Collections:Chemical and Biological Engineering, 1931-2016

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